Recently, self-developed cupric acid project has made a breakthrough progress, solved the safety problem under high copper ion concentration and the key technical bottleneck of etching rate decline, achieved the ultimate life of cupric acid of 8000ppm, and it is far beyond the industry's upper limit of 7000ppm for the high-hydrogen peroxide one-dose system. This achievement is not only expected to further reduce production costs and enhance its competitiveness, but also shows CSOT's self-developed technical strength in the field of semiconductor display for core basic technologies and materials.
